Micro silicon technology for active matrix OLED display

被引：8

作者：

Arai, Toshiaki ^{[1
]}

Morosawa, Narihiro ^{[1
]}

Hiromasu, Yasunobu ^{[1
]}

Hidaka, Koji ^{[1
]}

Nakayama, Tetsuo ^{[1
]}

Makita, Atsuya ^{[1
]}

Toyota, Motohiro ^{[1
]}

Hayashi, Naoki ^{[1
]}

Yoshimura, Yusuke ^{[1
]}

Sato, Ayumu ^{[1
]}

Namekawa, Kimiyasu ^{[1
]}

Inagaki, Yoshio ^{[1
]}

Umezu, Nobuhiko ^{[1
]}

Tatsuki, Koichi ^{[1
]}

机构：

[1] Sony Corp, Corp R&D, Display Device Dev Grp, Atsugi, Kanagawa, Japan

来源：

2007 SID INTERNATIONAL SYMPOSIUM, DIGEST OF TECHNICAL PAPERS, VOL XXXVIII, BOOKS I AND II | 2007年 / 38卷

关键词：

D O I：

10.1889/1.2785568

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

We developed novel "Micro Silicon" technology for AM-OLED display. The micro crystalline silicon TFTs formed by dLTA (diode Laser Thermal Anneal) system realized uniform and stable current flow in large display area. A 27.3-inch diagonal AM-OLED display was demonstrated to provide applicable solution for OLED TV mass-production.

引用

页码：1370 / 1373

页数：4