We experimentally clarify the effects of barrier dopings on the polarization induced electric fields and the band structure in InGaN/GaN blue light emitting diodes. Both effects were independently verified by using electric field modulated reflectance and capacitance-voltage measurement. It is shown that the Si barrier doping does reduce the polarization induced electric field in the quantum wells. But the benefit of Si-doping is nullified by modification of the band structure and depletion process. With increased number of doped barriers, smaller number of quantum wells remains in the depletion region at the onset of the diffusion process, which can reduce the effective active volume and enhance the electron overflow. (C) 2014 AIP Publishing LLC.
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Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, JapanTohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Kuboya, Shigeyuki
Matsuoka, Takashi
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Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, JapanTohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Matsuoka, Takashi
Honda, Yoshio
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Nagoya Univ, Inst Mat & Syst Sustainabil, Ctr Integrated Res Future Elect, Nagoya, Aichi 4648603, JapanTohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
Honda, Yoshio
Amano, Hiroshi
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Nagoya Univ, Inst Mat & Syst Sustainabil, Ctr Integrated Res Future Elect, Nagoya, Aichi 4648603, JapanTohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
机构:
Korea Adv Nano Fab Ctr KANC, Suwon, South KoreaKorea Adv Nano Fab Ctr KANC, Suwon, South Korea
Song, Keun-Man
Park, Jinsub
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Hanyang Univ, Dept Elect Engn, Seoul 133791, South Korea
Hanyang Univ, Dept Elect & Comp Engn, Seoul 133791, South KoreaKorea Adv Nano Fab Ctr KANC, Suwon, South Korea