共 50 条
[42]
High rate etching of sapphire wafer using Cl2/BCl3/Ar inductively coupled plasmas
[J].
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY,
2001, 82 (1-3)
:50-52
[45]
Nonselective and smooth etching of GaN/AlGaN heterostructures by Cl2/Ar/BCl3 inductively coupled plasmas
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
2004, 22 (02)
:407-412
[46]
Volume and heterogeneous chemistry in Cl2/Ar inductively coupled plasma
[J].
MICRO- AND NANOELECTRONICS 2003,
2004, 5401
:64-71
[48]
Inductively coupled Cl2/Ar plasma:: Experimental investigation and modeling
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A,
2003, 21 (04)
:1568-1573