Electron temperatures of inductively coupled Cl2-Ar plasmas

被引:51
作者
Fuller, NCM
Donnelly, VM
Herman, IP [1 ]
机构
[1] Columbia Univ, Columbia Radiat Lab, Dept Appl Phys, New York, NY 10027 USA
[2] Agere Syst, Murray Hill, NJ 07974 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 2002年 / 20卷 / 01期
关键词
D O I
10.1116/1.1427884
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Trace rare gases optical emission spectroscopy has been used to measure the electron temperature, T-e, in a high-density inductively coupled Cl-2-Ar plasma at 18 mTorr as function of the 13.56 MHz radio frequency power and Ar fraction. Only the Kr and Xe emission lines were used to determine T-e, because of evidence of radiation trapping when the Ar emission lines were also used for larger At fractions. At 600 W (10.6 W cm(-2)), T-e increases from similar to4.0 +/- 0.5 eV to similar to6.0 +/- 2.0 eV as the Ar fraction increases from 1% to 96%. In the H (inductive, bright) mode, T-e, for a "neat" chlorine plasma (including 1% of each He/Ne/Ar/Kr/Xe) increases only slightly from similar to3.8 to 4.0 eV as power increases from 450 to 750 W. This increase is much larger for larger Ar fractions, such as from similar to4.0 to 7.3 eV for 78% Ar. Most of these effects can be understood using the fundamental particle balance equation. (C) 2002 American Vacuum Society.
引用
收藏
页码:170 / 173
页数:4
相关论文
共 50 条
[31]   Feedback control of HfO2 etch processing in inductively coupled Cl2/N2/Ar plasmas [J].
Lin, Chaung ;
Leou, Keh-Chyang ;
Li, Ting-Chieh ;
Lee, Lurng-Shehng ;
Tzeng, Pei-Jer .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2008, 26 (05) :1282-1286
[32]   Investigation on the parameter distribution of Ar/O2 inductively coupled plasmas [J].
Han, Xinmin ;
Wei, Xiaolong ;
Xu, Haojun ;
Zhang, Wenyuan ;
Li, Yinghui ;
Li, Yiwen ;
Yang, Zixin .
VACUUM, 2019, 168
[33]   Ultrahigh frequency versus inductively coupled chlorine plasmas:: Comparisons of Cl and Cl2 concentrations and electron temperatures measured by trace rare gases optical emission spectroscopy [J].
Malyshev, MV ;
Donnelly, VM ;
Samukawa, S .
JOURNAL OF APPLIED PHYSICS, 1998, 84 (03) :1222-1230
[34]   Diagnostics of inductively coupled chlorine plasmas:: Measurement of Cl2 and Cl number densities [J].
Malyshev, MV ;
Donnelly, VM .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (11) :6207-6215
[35]   Diagnostics of chlorine inductively coupled plasmas. Measurement of electron temperatures and electron energy distribution functions [J].
Malyshev, MV ;
Donnelly, VM .
JOURNAL OF APPLIED PHYSICS, 2000, 87 (04) :1642-1649
[36]   Diagnostics of inductively coupled chlorine plasmas:: Measurement of Cl2+ and Cl+ densities [J].
Malyshev, MV ;
Fuller, NCM ;
Bogart, KHA ;
Donnelly, VM ;
Herman, IP .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (05) :2246-2251
[37]   Electron collision frequency in inductively coupled plasmas [J].
Godyak, VA .
ATOMIC PROCESSES IN PLASMAS: ELEVENTH APS TOPICAL CONFERENCE, 1998, 443 :365-365
[39]   Etching Characteristics and Mechanisms of TiO2 Thin Films in CF4 + Ar, Cl2 + Ar and HBr plus Ar Inductively Coupled Plasmas [J].
Lee, Junmyung ;
Efremov, Alexander ;
Lee, Byung Jun ;
Kwon, Kwang-Ho .
PLASMA CHEMISTRY AND PLASMA PROCESSING, 2016, 36 (06) :1571-1588
[40]   Effects of the excited states on electron kinetics and power absorption and dissipation in inductively coupled Ar plasmas [J].
Yang, Wei ;
Gao, Fei ;
Wang, You-Nian .
AIP ADVANCES, 2022, 12 (05)