Large-area achromatic interferometric lithography for 100 nm period gratings and grids

被引：159

作者：

Savas, TA

Schattenburg, ML

Carter, JM

Smith, HI

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1996年 / 14卷 / 06期

关键词：

D O I：

10.1116/1.588613

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Achromatic interferometric lithography is the preferred approach for producing large-area, spatially coherent 100 nm period gratings and grids. We report on improvements to processes which have enabled exposure areas of approximate to 10 cm(2). In addition, we report on the fabrication of 100 nm period free-standing gold gratings. (C) 1996 American Vacuum Society.

引用

页码：4167 / 4170

页数：4

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