Internal Stresses in Mo/Y Multilayer Mirrors

被引：7

作者：

Kvashennikov, D. S. ^{[1
]}

Vainer, Yu A. ^{[1
]}

Zuev, S. Yu ^{[1
]}

Polkovnikov, V. N. ^{[1
]}

机构：

[1] Russian Acad Sci, Inst Phys Microstruct, Nizhnii Novgorod 603087, Russia

来源：

JOURNAL OF SURFACE INVESTIGATION | 2019年 / 13卷 / 02期

基金：

俄罗斯基础研究基金会;

关键词：

multilayer mirrors; X-ray optics; internal stress; magnetron sputtering; X-RAY REFLECTIVITY; EXTREME-ULTRAVIOLET;

D O I：

10.1134/S1027451019020113

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

Mo/Y multilayer mirrors designed to operate in the range of 9-11 nm are considered. The dependence of the internal stress of such mirrors on the molybdenum fraction is studied for the first time. It is shown that structures with zero stress are characterized by a reflection coefficient of about 6%. The experimentally obtained maximum reflection coefficient (30%) corresponds to a stress of -160 MPa. The influence of a buffer layer of boron carbide on the internal stress and reflectance factor of the Mo/Y mirrors is investigated. A Cr/Y structure is proposed for compensation of elastic deformations of the substrate in manufacturing highly reflective Mo/Y multilayer mirrors.

引用

页码：177 / 181

页数：5

共 22 条

[1] Current status and development prospects for multilayer X-ray optics at the Institute for Physics of Microstructures, Russian Academy of Sciences [J].

Akhsakhalyan A.D. ;

Kluenkov E.B. ;

Lopatin A.Y. ;

Luchin V.I. ;

Nechay A.N. ;

Pestov A.E. ;

Polkovnikov V.N. ;

Salashchenko N.N. ;

Svechnikov M.V. ;

Toropov M.N. ;

Tsybin N.N. ;

Chkhalo N.I. ;

Shcherbakov A.V. .

Journal of Surface Investigation, 2017, 11 (01) :1-19

[2]

Andreev S. S., 2005, POVERKHNOST, P45

[3] The microstructure and X-ray reflectivity of Mo/Si multilayers [J].

Andreev, SS ;

Gaponov, SV ;

Gusev, SA ;

Haidl, MN ;

Kluenkov, EB ;

Prokhorov, KA ;

Polushkin, NI ;

Sadova, EN ;

Salashchenko, NN ;

Suslov, LA ;

Zuev, SY .

THIN SOLID FILMS, 2002, 415 (1-2) :123-132

[4] Laboratory methods for investigations of multilayer mirrors in extreme ultraviolet and soft X-ray region [J].

Bibishkin, MS ;

Chekhonadskih, DP ;

Chkhalo, NI ;

Kluyenkov, EB ;

Pestov, AE ;

Salashchenko, NN ;

Shmaenok, LA ;

Zabrodin, IG ;

Zuev, SY .

MICRO- AND NANOELECTRONICS 2003, 2004, 5401 :8-15

[5] Advanced materials for multilayer mirrors for extreme ultraviolet solar astronomy [J].

Bogachev, S. A. ;

Chkhalo, N. I. ;

Kuzin, S. V. ;

Pariev, D. E. ;

Polkovnikov, V. N. ;

Salashchenko, N. N. ;

Shestov, S. V. ;

Zuev, S. Y. .

APPLIED OPTICS, 2016, 55 (09) :2126-2135

[6] CALCULATION OF STRESS IN ELECTRODEPOSITS FROM THE CURVATURE OF A PLATED STRIP [J].

BRENNER, A ;

SENDEROFF, S .

JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1949, 42 (02) :105-123

[7] Be/Al-based multilayer mirrors with improved reflection and spectral selectivity for solar astronomy above 17 nm wavelength [J].

Chkhalo, N. I. ;

Pariev, D. E. ;

Polkovnikov, V. N. ;

Salashchenko, N. N. ;

Shaposhnikov, A. ;

Stroulea, I. L. ;

Svechnikov, M. V. ;

Vainer, Yu. A. ;

Zuev, S. Yu. .

THIN SOLID FILMS, 2017, 631 :106-111

[8] Next generation nanolithography based on Ru/Be and Rh/Sr multilayer optics [J].

Chkhalo, N. I. ;

Salashchenko, N. N. .

AIP ADVANCES, 2013, 3 (08)

[9] High performance La/B4C multilayer mirrors with barrier layers for the next generation lithography [J].

Chkhalo, N. I. ;

Kuenstner, S. ;

Polkovnikov, V. N. ;

Salashchenko, N. N. ;

Schaefers, F. ;

Starikov, S. D. .

APPLIED PHYSICS LETTERS, 2013, 102 (01)

[10] High-reflection Mo/Be/Si multilayers for EUV lithography [J].

Chkhalo, Nikolai I. ;

Gusev, Sergei A. ;

Nechay, Andrey N. ;

Pariev, Dmitry E. ;

Polkovnikov, Vladimir N. ;

Salashchenko, Nikolai N. ;

Schaefers, Franz ;

Sertsu, Mewael G. ;

Sokolov, Andrey ;

Svechnikov, Mikhail V. ;

Tatarsky, Dmitry A. .

OPTICS LETTERS, 2017, 42 (24) :5070-5073

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