The impact on OPC and SRAF caused by EUV shadowing effect

被引：0
|
作者：
Jiang, Fan [1 ]
机构：
[1] Mentor Graph Corp, EUV OPC, Wilsonville, OR 97070 USA
来源：
SOLID STATE TECHNOLOGY | 2014年 / 57卷 / 01期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
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页码：27 / 30
页数：4
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