Influence of film characteristics on the sputtering rate of MgO

被引：0

作者：

Hidaka, S ^{[1
]}

Ishimoto, M ^{[1
]}

Iwase, N ^{[1
]}

Betsui, K ^{[1
]}

Inoue, H ^{[1
]}

机构：

[1] Fujitsu Labs Ltd, Akashi, Hyogo 6748555, Japan

来源：

IEICE TRANSACTIONS ON ELECTRONICS | 1999年 / E82C卷 / 10期

关键词：

MgO; PDP; sputtering; density;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We investigated the relationship between the film characteristics and the sputtering rate of the MgO protecting layer in AC-PDP. As possible elements for determining the sputtering rate, we considered the density, orientation, and surface morphology. With respect to the orientation, we found that the sputtering rate increased for the sequence of (200) < (220) < (111). However, we noticed that orientation and surface structure are not really decisive factors affecting the sputtering rate; the density of the film is most important.

引用

页码：1804 / 1807

页数：4

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