Thermomigration of molten Cr-Si-C alloy in 4H-SiC at 1873-2273 K

被引:7
|
作者
Kawanishi, Sakiko [1 ]
Yoshikawa, Takeshi [2 ]
Shibata, Hiroyuki [1 ]
机构
[1] Tohoku Univ, Inst Multidisciplinary Res Adv Mat, Aoba Ku, 2-1-1 Katahira, Sendai, Miyagi 9808577, Japan
[2] Univ Tokyo, Inst Ind Sci, Meguro Ku, 4-6-1 Komaba, Tokyo 1538505, Japan
关键词
Solubility; Diffusion; Temperature gradient zone melting method; Semiconducting silicon compounds; Silicon carbide; Thermodynamics; SOLUTION GROWTH; THERMODYNAMIC EVALUATION; LIQUID-PHASE; SILICON; DIFFUSION; VISCOSITY; SURFACE;
D O I
10.1016/j.jcrysgro.2019.04.022
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Thermomigration of molten Cr-Si-C alloys in silicon carbide (SiC) along a quasi-binary Cr-SiC system at 1873-2273 K was evaluated by the temperature gradient zone melting method. Solute diffusivity in the molten alloy and distribution of Cr between 4H-SiC and the alloy were studied, where both properties are important for designing a process for the solution growth of single crystalline 4H-SiC. The migration was found to be controlled by interdiffusion in the molten alloy from the measured migration rate. The obtained interdiffusion coefficients were (0.11-1.3) x10(-7)m(2) s(-1), and these increased with increasing temperature. The Cr impurities in 4H-SiC were found to be distributed to maintain the thermodynamic equilibration with the alloy, and increased with temperature in the range of (0.26-2.2) x10(17) cm(-3). The thermodynamic property of Cr in SiC was assessed, and will enable the solubility of Cr in 4H-SiC grown at various solvent temperatures and compositions to be estimated.
引用
收藏
页码:73 / 80
页数:8
相关论文
共 33 条
  • [1] Availability of Cr-rich Cr-Si solvent for rapid solution growth of 4H-SiC
    Kawanishi, Sakiko
    Nagamatsu, Yoichiro
    Yoshikawa, Takeshi
    Shibata, Hiroyuki
    JOURNAL OF CRYSTAL GROWTH, 2020, 549
  • [2] In Situ Interface Observation of 3C-SiC Nucleation on Basal Planes of 4H-SiC During Solution Growth of SiC from Molten Fe-Si Alloy
    Kawanishi, Sakiko
    Yoshikawa, Takeshi
    JOM, 2018, 70 (07) : 1239 - 1247
  • [3] Availability of Cr-rich Cr-Si solvent for rapid solution growth of 4H-SiC
    Kawanishi S.
    Nagamatsu Y.
    Yoshikawa T.
    Shibata H.
    Journal of Crystal Growth, 2020, 549
  • [4] Effect of aluminum addition on the surface step morphology of 4H-SiC grown from Si-Cr-C solution
    Mitani, Takeshi
    Komatsu, Naoyoshi
    Takahashi, Tetsuo
    Kato, Tomohisa
    Harada, Shunta
    Ujihara, Toru
    Matsumoto, Yuji
    Kurashige, Kazuhisa
    Okumura, Hajime
    JOURNAL OF CRYSTAL GROWTH, 2015, 423 : 45 - 49
  • [5] Top-Seeded Solution Growth of 4H-SiC Bulk Crystal Using Si-Cr Based Melt
    Daikoku, H.
    Kado, M.
    Sakamoto, H.
    Suzuki, H.
    Bessho, T.
    Kusunoki, K.
    Yashiro, N.
    Okada, N.
    Moriguchi, K.
    Kamei, K.
    SILICON CARBIDE AND RELATED MATERIALS 2011, PTS 1 AND 2, 2012, 717-720 : 61 - +
  • [6] Growth rate and surface morphology of 4H-SiC crystals grown from Si-Cr-C and Si-Cr-Al-C solutions under various temperature gradient conditions
    Mitani, Takeshi
    Komatsu, Naoyoshi
    Takahashi, Tetsuo
    Kato, Tomohisa
    Fujii, Kuniharu
    Ujihara, Toru
    Matsumoto, Yuji
    Kurashige, Kazuhisa
    Okumura, Hajime
    JOURNAL OF CRYSTAL GROWTH, 2014, 401 : 681 - 685
  • [7] Comparative Studies of Carrier Dynamics in 3C-SiC Layers Grown on Si and 4H-SiC Substrates
    Scajev, Patrik
    Hassan, Jawad
    Jarasiunas, Kestutis
    Kato, Masashi
    Henry, Anne
    Bergman, J. Peder
    JOURNAL OF ELECTRONIC MATERIALS, 2011, 40 (04) : 394 - 399
  • [8] Comparative Study of 4H-SiC Epitaxial Layers Grown on 4° Off-Axis Si- and C-Face Substrates Using Bistrimethylsilylmethane Precursor
    Lee, Hunhee
    Kim, Hyunwoo
    Seo, Han Seok
    Lee, Dohyun
    Kim, Changhyun
    Lee, Suhyeong
    Kang, Hongjeon
    Heo, Jaeyeong
    Kim, Hyeong Joon
    ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY, 2015, 4 (08) : N89 - N95
  • [9] A promising Si-Cr-Nd-C solution system designed for rapid growth of 3C-SiC at a low temperature of 1873 K
    Han, Chen
    Lei, Minpeng
    Wang, Zongxian
    Yang, Hongyu
    Ma, Wenhui
    Lei, Yun
    CRYSTENGCOMM, 2025,
  • [10] Activation of implanted Al and co-implanted Al/C or Al/Si in 4H-SiC
    Jones, KA
    Zheleva, TS
    Ervin, MH
    Shah, PB
    Derenge, MA
    Gerardi, G
    Freitas, JA
    Vispute, RD
    SILICON CARBIDE AND RELATED MATERIALS 2003, PRTS 1 AND 2, 2004, 457-460 : 929 - 932