Optical properties of heavily Mg-doped p-GaN films prepared by reactive ion etching

被引:2
作者
Lin, YJ [1 ]
Chu, YL
Liu, DS
Lee, CS
Chien, FT
机构
[1] Natl Changhua Univ Educ, Inst Photon, Changhua 500, Taiwan
[2] Natl Formosa Univ, Inst Electopt & Mat Sci, Huwei 632, Taiwan
[3] Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 106, Taiwan
[4] Feng Chia Univ, Dept Elect Engn, Taichung 407, Taiwan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 1A期
关键词
GaN; photoluminescence; reactive ion etching; donor-acceptor pair; nitrogen vacancy;
D O I
10.1143/JJAP.45.64
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of the damage caused by reactive ion etching on the optical properties of heavily Mg-doped p-type GaN (p-GaN) was investigated in this study. After etching, we found that the blue luminescence (BL) is redshifted and the intensity of the redshifted BL is markedly increased at room temperature, which are attributed to the formation of the lattice disorder resulting in the domination of distant donor-acceptor pairs (DAPs) and the formation of more nitrogen-vacancy-related defects resulting in more recombination centers D responsible for DAP transition.
引用
收藏
页码:64 / 66
页数:3
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