Identifying suitable substrates for high-quality graphene-based heterostructures

被引:90
作者
Banszerus, L. [1 ,2 ]
Janssen, H. [1 ,2 ]
Otto, M. [3 ]
Epping, A. [1 ,2 ,4 ]
Taniguchi, T. [5 ]
Watanabe, K. [5 ]
Beschoten, B. [1 ,2 ]
Neumaier, D. [3 ]
Stampfer, C. [1 ,2 ,4 ]
机构
[1] Rhein Westfal TH Aachen, JARA FIT, D-52074 Aachen, Germany
[2] Rhein Westfal TH Aachen, Inst Phys 2, D-52074 Aachen, Germany
[3] AMO GmbH, Adv Microelect Ctr Aachen AMICA, D-52074 Aachen, Germany
[4] Forschungszentrum Julich, Peter Grunberg Inst PGI 9, D-52425 Julich, Germany
[5] Natl Inst Mat Sci, 1-1 Namiki, Tsukuba, Ibaraki 3050044, Japan
关键词
graphene; substrate; Raman spectroscopy; high quality; CHEMICAL-VAPOR-DEPOSITION; RAMAN-SPECTROSCOPY; MONOLAYER GRAPHENE; FILMS; CRYSTALS; STRAIN;
D O I
10.1088/2053-1583/aa5b0f
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We report on a scanning confocal Raman spectroscopy study investigating the strain-uniformity and the overall strain and doping of high-quality chemical vapour deposited (CVD) graphene-based heterostuctures on a large number of different substrate materials, including hexagonal boron nitride (hBN), transition metal dichalcogenides, silicon, different oxides and nitrides, as well as polymers. By applying a hBN-assisted, contamination free, dry transfer process for CVD graphene, high-quality heterostructures with low doping densities and low strain variations are assembled. The Raman spectra of these pristine heterostructures are sensitive to substrate-induced doping and strain variations and are thus used to probe the suitability of the substrate material for potential high-quality graphene devices. We find that the flatness of the substrate material is a key figure for gaining, or preserving high-quality graphene.
引用
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页数:8
相关论文
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