Magnetic anisotropies in oblique columnar growth of FeCoB films

被引:4
作者
Aldimassi, A. M. [1 ]
Chevalier, A. [1 ]
Ben Youssef, J. [1 ]
Laur, V. [1 ]
Rouvellou, B. [1 ]
机构
[1] Univ Bretagne Occidentale, CNRS, Lab STICC, UMR 6285, 6 Ave Gorgeu,CS93837, F-29238 Brest 3, France
关键词
THIN-FILMS; HIGH MOMENT; SOFT;
D O I
10.1063/5.0003895
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We report on the evolution of anisotropies of FeCoB thin films deposited by magnetron sputtering with different oblique angles increasing from alpha = 0 degrees to alpha = 75 degrees. The oblique incidence deposition using the Fe43Co43B14 target leads, under chosen conditions, to columnar growth without bundling. This columnar structure results in a correlated increase in the anisotropy field and of the resonance frequency values, observed with an increasing oblique incidence angle from alpha = 0 degrees to alpha = 45 degrees. However, these values decrease from alpha = 45 degrees to alpha = 75 degrees. To get a better understanding of the reversal magnetization process, in plane angular distribution of different magnetic parameters was carried out, and the role of easy axis dispersion was especially investigated. The optimized conditions of deposition, leading to controlled high resonance frequencies, could be useful in the design of FeCoB-based microwave devices.
引用
收藏
页数:7
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