Roughness scaling in titanium thin films: A three-dimensional molecular dynamics study of rotational and static glancing angle deposition

被引：10

作者：

Backholm, Matilda ^{[1
]}

Foss, Morten ^{[1
]}

Nordlund, Kai ^{[2
]}

机构：

[1] Aarhus Univ, Interdisciplinary Nanosci Ctr iNANO, DK-8000 Aarhus C, Denmark

[2] Univ Helsinki, Dept Phys, Helsinki 00014, Finland

来源：

APPLIED SURFACE SCIENCE | 2013年 / 268卷

关键词：

Glancing angle deposition; Surface roughness; Molecular dynamics simulations; GROWTH; MICROSTRUCTURE; SIMULATION; FABRICATION;

D O I：

10.1016/j.apsusc.2012.12.077

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Three-dimensional molecular dynamics simulations of the glancing angle deposition of titanium was performed both with and without substrate rotation for different deposition angles (alpha = 85 degrees, 80 degrees, 55 degrees, and 0 degrees). The surface roughness of the final films, all consisting of 10,000 deposited atoms, was calculated at different length scales of the substrate. The roughness scaling was shown to be, within error, identical for the rotational and static glancing angle deposited thin films. (C) 2012 Elsevier B.V. All rights reserved.

引用

页码：270 / 273

页数：4

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