Preparation conditions of CaTiO3 film by metal-organic chemical vapor deposition

被引:12
|
作者
Sato, Mitsutaka [1 ]
Tu, Rong
Goto, Takashi
机构
[1] Tohoku Univ, Grad Sch, Dept Mat Sci, Sendai, Miyagi 9808577, Japan
[2] Tohoku Univ, Inst Mat Res, Sendai, Miyagi 9808577, Japan
关键词
metal-organic chemical vapor deposition; CaTiO3; crystal structure; microstructure; deposition rate;
D O I
10.2320/matertrans.47.1386
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Calcium titanate (CaTiO3) films were prepared by metal-organic chemical vapor deposition (MOCVD) using Ca(dpm)(2) and Ti(O-i-Pr)(2)(dpm)(2) precursors. The phases, composition and morphology of Ca-Ti-O system films changed depending on molar ratio of Ca to Ti (R-Ca/Ti), total pressure (P-tot) and substrate temperature (T-sub). CaTiO3 films in a single phase were obtained at the condition of R-Ca/Ti = 0.95, T-sub = 1073 K and P-tot = 0.8 kPa, and R-Ca/Ti = 0.78, T-sub = 973 K and P-tot = 0.8 kPa. The CaTiO3 films prepared at T-sub = 1073 K had a well-developed columnar texture, and significant (010) orientation was observed at RCa/Ti from 0.59 to 0.72. The deposition rate showed the highest value of 1.25 x 10(-8) m s(-1) at T-sub = 1073 K, P-tot = 0.4 kPa and R-Ca/Ti = 0.95.
引用
收藏
页码:1386 / 1390
页数:5
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