Mitigating Field Enhancement in Metasurfaces and Metamaterials for High-Power Microwave Applications

被引:16
作者
Bossard, Jeremy A. [1 ,2 ]
Scarborough, Clinton P. [3 ]
Wu, Qi [4 ]
Campbell, Sawyer D. [1 ]
Werner, Douglas H. [1 ]
Werner, Pingjuan L. [1 ]
Griffiths, Scott [5 ]
Ketner, Matthew [5 ,6 ]
机构
[1] Penn State Univ, University Pk, PA 16802 USA
[2] Lockheed Martin Rotary & Mission Syst, Camden, NJ 08103 USA
[3] ExH Inc, State Coll, PA 16803 USA
[4] SensorMetrix Inc, San Diego, CA 92126 USA
[5] Joint Nonlethal Weap Directorate, Quantico, VA 22134 USA
[6] Naval Surface Warfare Ctr, Dahlgren Div, Directed Energy Warfare Off, Dahlgren, VA 22448 USA
关键词
Field enhancement; genetic algorithms (GAs); high-impedance surface; high-power microwave; metamaterials; metasurfaces; negative index; periodic structures; transformation optics (TO); PATCH-ANTENNA; TRANSMISSION; SURFACE; OPTICS;
D O I
10.1109/TAP.2016.2623643
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Metasurfaces and metamaterials have been explored extensively in recent years for their ability to enable a variety of innovative microwave devices. However, because their exotic properties often arise from resonant structures, the large field enhancements under high-power microwave illumination can lead to dielectric breakdown and damage to the device. In order to develop metasurfaces and metamaterials capable of being utilized in high-power microwave applications, this paper investigates techniques for reducing the maximum field enhancement factor (MFEF) in several types of structures from the literature. Starting with a simple Sievenpiper metasurface, this paper evaluates the dependence of MFEF on the structure design parameters. For more complex metasurface geometries, a genetic algorithm is demonstrated that can evolve structures that have minimal MFEF. In addition, negative-index and low-index metamaterials are evaluated for field enhancement. By optimizing for low loss and by operating in the resonance tails, metamaterials with low MFEF can be realized for high-power applications. To illustrate this, a quad-beam focusing metamaterial lens is presented with an MFEF less than 5 over the entire operating band.
引用
收藏
页码:5309 / 5319
页数:11
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