Plasma Etch Process

被引：0
|
作者：
Nabila, Belkhelfa [1 ]
机构：
[1] CDTA, Algiers, Algeria
来源：
LASER AND PLASMA APPLICATIONS IN MATERIALS SCIENCE | 2008年 / 1047卷
关键词：
dry etch; Reactive Ion Etch; pressure; RF power; etchant gases; Lam; 4500; 4400; recipe;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
In this paper, we define plasma etch process and we describe two etch equipments used in our clean room: Lain 4500 and Lam 4400.
引用
收藏
页码：220 / 223
页数：4
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