Ablation of gold film on different substrates by ultrafast laser

被引：12
作者：
Zhou, Songhua [1 ]
Zhao, Kai [2 ]
Shen, Hong [1 ,3 ]
机构：
[1] Shanghai Jiao Tong Univ, Sch Mech Engn, Shanghai 200240, Peoples R China
[2] Shanghai Aerosp Equipments Manufacturer Co Ltd, Shanghai 200245, Peoples R China
[3] State Key Lab Mech Syst & Vibrat, Shanghai 200240, Peoples R China
来源：
OPTICS AND LASER TECHNOLOGY | 2020年 / 132卷
关键词：
Ultrafast laser; Ablation threshold; Substrates; Gold film; Two temperature model; HEAT-TRANSFER; ELECTRON; DEFORMATION; EXCITATION; DYNAMICS; METALS; HYBRID;
D O I：
10.1016/j.optlastec.2020.106495
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Ultrafast laser processing of metal films has attracted a lot of attentions. A study on ablation threshold of gold film on different substrates irradiated by single pulse ultrafast laser is presented. Dynamic description of laser absorption and temperature evolution of electron and lattice are achieved based on two temperature model considering boundary conditions of heat transfer at different material interfaces. The numerical model is validated through the ablated zone induced by single pulse ablation experiments. The glass substrate can greatly reduce ablation threshold of gold film compared with the chromium substrate and gold substrate. Moreover, the substrate thickness has a slight effect on the ablation threshold.
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页数：9
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