CARBON NANOSTRUCTURES FORMATION DURING PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION

被引：0

作者：

Grigonis, A. ^{[1
]}

Rutkuniene, Z. ^{[1
]}

Kaminskas, V. ^{[1
]}

机构：

[1] Kaunas Univ Technol, Kaunas, Lithuania

来源：

INTERNATIONAL CONFERENCE ON RADIATION INTERACTION WITH MATERIALS AND ITS USE IN TECHNOLOGIES 2008 | 2008年

关键词：

a-CH films; micro hardness; Raman spectroscopy; surface morphology; ellipsometry;

D O I：

暂无

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Formation of nano structures during a-CH films deposition from acetylene oil the Ni coated silicon by plasma enhanced chemical vapor deposition was idea of this work. The film properties were investigated by Raman spectroscopy (RS), null-ellipsometry and micro hardness measurements. Surface morphology was analyzed by scanning electron microscopy (SEM) model JEOL JSM-5600. It was obtained that type and surface morphology of formatted a-CH films depend on current density when ion energies (100-200)eV.

引用

页码：123 / 126

页数：4

共 9 条

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