Deposition property investigation of a focused ion beam for a high-aspect-ratio metal tip

被引：1
作者：
Choi, Dae Keun [1 ]
Lee, Sang Hoon [1 ,2 ]
机构：
[1] Seoul Natl Univ Sci & Technol, Grad Sch NID Fus Technol, Seoul 139743, South Korea
[2] Seoul Natl Univ Sci & Technol, Dept Automot Engn, Seoul 139743, South Korea
来源：
MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS | 2013年 / 19卷 / 03期
基金：
新加坡国家研究基金会;
关键词：
FABRICATION; PROBE;
D O I：
10.1007/s00542-012-1616-8
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We investigate the deposition properties of a focused ion beam for the fabrication of metal structures. We performed experiments under various beam currents, deposition times, and initial design diameters and analyzed the fabricated diameters and heights with recorded video clips. We observed abnormal deposition phenomena which show the etching effect as well as deposition, and investigated the relationship between the etching and parameters such as beam current and designed diameter. We apply these conditions and finally fabricate a high-aspect-ratio tip without abnormal deposition phenomena.
引用
收藏
页码：363 / 370
页数：8
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