Tin(II) hexafluoroacetylacetonate as a precursor in atmospheric pressure chemical vapour deposition: synthesis, structure and properties

被引：6
作者：
Sevastyanov, Vladimir G. [1 ]
Simonenko, Elizaveta P. [1 ]
Ignatov, Petr A. [1 ]
Popov, Viktor S. [1 ]
Churakov, Andrei V. [1 ]
Kuznetsov, Nikolai T. [1 ]
Sergienko, Vladimir S. [1 ]
机构：
[1] Russian Acad Sci, NS Kurnakov Inst Gen & Inorgan Chem, Moscow 119991, Russia
来源：
MENDELEEV COMMUNICATIONS | 2012年 / 22卷 / 05期
基金：
俄罗斯基础研究基金会;
关键词：
SNO2; THIN-FILMS; TIN OXIDE; GAS SENSORS; SCIENCE; SURFACE; CVD;
D O I：
10.1016/j.mencom.2012.09.003
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
A new method for the synthesis of volatile tin(II) hexafluoroacetylacetonate [Sn(C5HO2F6)(2)] was suggested, the compound was characterized by elemental analysis, IR spectroscopy, and DTA/TGA; the crystal structure was established by X-ray diffraction; the morphology and composition of the coating deposited by atmospheric pressure chemical vapour deposition were studied by SEM-EDX and XRD.
引用
收藏
页码：239 / 241
页数：3
相关论文
共 50 条
  • [41] Characterization of Thin Films Deposited with Precursor Ferrocene by Plasma Enhanced Chemical Vapour Deposition
    姚凯伦
    郑建万
    刘祖黎
    贾丽慧
    Plasma Science and Technology, 2007, (04) : 436 - 439
  • [42] High vacuum chemical vapour deposition of oxides: A review of technique development and precursor selection
    Kuzminykh, Yury
    Dabirian, Ali
    Reinke, Michael
    Hoffmann, Patrik
    SURFACE & COATINGS TECHNOLOGY, 2013, 230 : 13 - 21
  • [43] Characterization of thin films deposited with precursor ferrocene by plasma enhanced chemical vapour deposition
    Yao, Kailun
    Zheng, Jianwan
    Liu, Zuli
    Jia, Lihui
    PLASMA SCIENCE & TECHNOLOGY, 2007, 9 (04) : 436 - 439
  • [44] The Effect of Pressure on the Dimensions of Carbon Nanotubes Obtained by the Chemical Vapour Deposition
    Sharma, Anshu
    Vijay, Y. K.
    ADVANCED SCIENCE LETTERS, 2011, 4 (02) : 586 - 590
  • [45] Textured Fluorine-Doped Tin Dioxide Films formed by Chemical Vapour Deposition
    Bhachu, Davinder S.
    Waugh, Mathew R.
    Zeissler, Katharina
    Branford, Will R.
    Parkin, Ivan P.
    CHEMISTRY-A EUROPEAN JOURNAL, 2011, 17 (41) : 11613 - 11621
  • [46] Electrical, Structural, and Morphological Characteristics of Dopantless Tin Oxide Films Prepared by Low Pressure Chemical Vapor Deposition
    Kim, Jun-Hyun
    Cho, Sung-Woon
    Kang, Doo Won
    Lee, Kyung Mi
    Baek, Chang Yong
    Lee, Hae-Min
    Kim, Chang-Koo
    SCIENCE OF ADVANCED MATERIALS, 2016, 8 (01) : 117 - 121
  • [47] Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor
    Yang, Rong
    Zheng, Jie
    Li, Wei
    Qu, Jianglan
    Li, Xingguo
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2011, 44 (17)
  • [48] Synthesis of nanocrystalline silicon thin films using the increase of the deposition pressure in the hot-wire chemical vapour deposition technique
    Halindintwali, S.
    Knoesen, D.
    Swanepoel, R.
    Julies, B. A.
    Arendse, C.
    Muller, T.
    Theron, C. C.
    Gordijn, A.
    Bronsveld, P. C. P.
    Rath, J. K.
    Schropp, R. E. I.
    SOUTH AFRICAN JOURNAL OF SCIENCE, 2009, 105 (7-8) : 290 - 293
  • [49] Chemical vapour deposition of soluble poly(p-xylylene) copolymers with tuneable properties
    Paulus, Ilka E.
    Heiny, Markus
    Shastri, V. Prasad
    Greiner, Andreas
    POLYMER CHEMISTRY, 2016, 7 (01) : 54 - 62
  • [50] Electrochromic and Optical Study of Atmospheric Pressure Chemical Vapour Deposition MoO3-Cr2O3 Films
    Ivanova, T.
    Gesheva, K. A.
    Kozlov, M.
    Abrashev, M.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (09) : 8017 - 8023
12345