Multilayer Deposition of Silica Sol-Gel Films by Electrochemical Assisted Techniques

被引:14
作者
Giordano, Gianmarco [1 ]
Durante, Christian [2 ]
Gennaro, Armando [2 ]
Guglielmi, Massimo [1 ]
机构
[1] Univ Padua, Dipartimento Ingn Ind, Via Marzolo 9, I-35135 Padua, Italy
[2] Univ Padua, Dipartimento Sci Chim, Via Marzolo 1, I-35131 Padua, Italy
关键词
AA2024-T3; ALUMINUM-ALLOY; THIN-FILMS; CORROSION PROTECTION; NANOCOMPOSITE FILMS; COMPOSITE FILMS; CRACK-FREE; ELECTRODEPOSITION; CODEPOSITION; COATINGS; STRESS;
D O I
10.1021/acs.jpcc.6b10040
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In the past decade, electro-assisted sol-gel deposition was employed by different groups in the world to deposit thin coatings on a variety of substrates. By applying a negative potential, the reduction reactions of water and oxygen occur at the working electrode, and the concurring generation of hydroxide makes the pH basic, thus enabling a faster condensation of sol-gel precursors. In this work, we present two new methods that allow one to modulate the thickness of the deposited layer. The first one consists in an electrochemically assisted deposition of multilayers, with a linear growth of the film up to ten layers. A final thickness of 1 +/- 0.1 mu m is achievable, without cracks and with no heat treatment required. The second method uses a pulsed potential in order to control the diffusion of hydroxide ions and, as a consequence, the growth of the silica layer on the substrate, determining a good homogeneity of the film. The starting solution contains a mixture of tetraethyl orthosilicate (TEOS), triethoxymethylsilane (MTES), water, ethanol, hydrochloric acid, and potassium nitrate as electrolyte. The samples are characterized by ellipsometery, using Cauchy model.
引用
收藏
页码:28820 / 28824
页数:5
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