Growth of NiO and MgO films on ag(100)

被引:102
作者
Wollschläger, J [1 ]
Erdös, D [1 ]
Goldbach, H [1 ]
Höpken, R [1 ]
Schröder, KM [1 ]
机构
[1] Leibniz Univ Hannover, Inst Festkorperphys, D-30167 Hannover, Germany
关键词
oxide growth; heteroepitaxy; surface morphology; relaxation; low energy electron diffraction; diffraction spot profile analysis;
D O I
10.1016/S0040-6090(01)01482-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The growth morphology of NiO and MgO films deposited in the temperature range 300-350 K has been studied by Spot Profile Analysis of Low Energy Electron Diffraction (SPA-LEED) patterns. The oxide films grow layer-by-layer. They are pseudomorphic during the initial stages. Relaxation via the injection of misfit dislocations with {110} glide planes occurs for coverages larger than a critical coverage (Theta (c) approximate to 5 ML for NiO, Theta (c) = 1-2 ML for MgO). The relaxation process leads to the formation of mosaics on the film surface. The tilt angle of the mosaics decreases with increasing oxide thickness due to minimisation of the deformation energy. (C) 2001 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:1 / 8
页数:8
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