The influence of inorganic oxidants and metal ions on semiconductor sensitized photodegradation of 4-fluorophenol

被引：152

作者：

Selvam, K. ^{[1
]}

Muruganandham, M. ^{[1
]}

Muthuvel, I. ^{[1
]}

Swaminathan, M. ^{[1
]}

机构：

[1] Annamalai Univ, Dept Chem, Annamalainagar 608002, India

来源：

CHEMICAL ENGINEERING JOURNAL | 2007年 / 128卷 / 01期

关键词：

4-fluorophenol; TiO2-P25; ZnO; UV-A light; photocatalysis;

D O I：

10.1016/j.cej.2006.07.016

中图分类号：

X [环境科学、安全科学];

学科分类号：

08 ; 0830 ;

摘要：

This paper mainly focuses on the influence of inorganic oxidants and metal ions on the TiO2, ZnO sensitized photodegradation of 4-fluorophenol (4-FP) by UV-A light. TiO2-P25 is more efficient than ZnO. Among the oxidants periodate ion was found to be more efficient than others in improving the degradation of 4-FP via formation of reactive radicals. The effect of oxidants on the degradation of 4-FP was found to be in the order of IO4- > BrO3- > S2O82- H2O2 > ClO3-. The effect of metal ions on degradation of 4-FP was found to be in the order of Mg2+ > Fe3+ > Fe2+ > Cu2+. The degradation of 4-FP follows pseudo-first order kinetics according to the Langmuir-Hinshelwood model. The photomineralisation has also been confirmed by COD, gas chromatography and fluoride ion measurements. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：51 / 57

页数：7

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