Glass densification under 193nm laser exposure: Experiment and theory.

被引：0
|
作者：
Allan, DC [1 ]
Smith, C [1 ]
Borrelli, NF [1 ]
Seward, TP [1 ]
机构：
[1] CORNING INC,GLASS & GLASS CERAM RES,CORNING,NY 14831
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1997年 / 213卷
关键词：
D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
引用
收藏
页码：23 / COMP
页数：2
相关论文
共 50 条
  • [21] UV and gas interactions in an enclosed 193nm excimer laser beamline
    Elliott, DJ
    Camp, JC
    Harlow, WC
    Dosoretz, V
    Behr, D
    Callahan, GP
    Flint, S
    EXCIMER LASERS, OPTICS, AND APPLICATIONS, 1997, 2992 : 51 - 63
  • [22] Fabrication of biosynthetic vascular prostheses by 193nm excimer laser radiation
    Husinsky, W
    Cseko, C
    Bartel, A
    Grabenwoger, M
    Fitzal, F
    Wolner, E
    LASER-TISSUE INTERACTION IX. PROCEEDINGS OF, 1998, 3254 : 241 - 248
  • [23] DAMAGE MECHANISMS FOR 193NM EXCIMER-LASER CORNEAL ABLATION
    MANSTEIN, D
    FORSTER, W
    SCHURENBERG, M
    HILLENKAMP, F
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 1994, 35 (04) : 2012 - 2012
  • [24] Densification of fused silica under 193-nm excitation
    Borrelli, NF
    Smith, C
    Allan, DC
    Seward, TP
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 1997, 14 (07) : 1606 - 1615
  • [25] ABSORPTION OF LASER-LIGHT IN AIR IN THE 193NM RANGE - ANALYSIS OF LASER LOCKING
    HITCHCOCK, LM
    KIM, GS
    RECK, GP
    ROTHE, EW
    JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 1990, 44 (03): : 373 - 378
  • [26] Study of 193nm resist degradation under various etch chemistries
    Bazin, Arnaud
    May, Michael
    Pargon, Erwine
    Mortini, Benedicte
    Joubert, Olivier
    ADVANCES IN RESIST MATERIALS AND PROCESSING TECHNOLOGY XXIV, 2007, 6519
  • [27] Nonlinear optical phenomena in phosphosilicate glass under 193 nm laser irradiation
    Larionov, Y. V.
    Sokolov, V. O.
    Plotnichenko, V. G.
    ICONO 2007: NOVEL PHOTONICS MATERIALS; OPTICS AND OPTICAL DIAGNOSTICS OF NANOSTRUCTURES, 2007, 6728
  • [28] Saline is a barrier to 193nm laser ablation, but not to 213nm solid stare laser ablation.
    Eikelboom, RH
    Dair, GT
    Ashman, RA
    van Saarioos, PP
    Schiberras, HC
    Reid, PG
    INVESTIGATIVE OPHTHALMOLOGY & VISUAL SCIENCE, 2000, 41 (04) : S919 - S919
  • [29] PHOTOACOUSTIC INJURY AND BONE HEALING FOLLOWING 193NM EXCIMER LASER ABLATION
    LUSTMANN, J
    ULMANSKY, M
    FUXBRUNNER, A
    LEWIS, A
    LASERS IN SURGERY AND MEDICINE, 1992, 12 (04) : 390 - 396
  • [30] Microfiber Fabry-Perot Sensors Inscribed by 193nm Excimer Laser
    Li, Jie
    Shen, Xiang
    Sun, Li-Peng
    Guan, Bai-Ou
    2012 PHOTONICS GLOBAL CONFERENCE (PGC), 2012,
12345