Precise control of surface wettability of mixed monolayers using a simple wiping method

被引：20

作者：

Lim, Jung Ah ^{[1
]}

Cho, Jeong Ho ^{[1
]}

Jang, Yunseok ^{[1
]}

Han, Joong Tark ^{[1
]}

Cho, Kilwon ^{[1
]}

机构：

[1] Pohang Univ Sci & Technol, Dept Chem Engn, Pohang 790784, South Korea

来源：

THIN SOLID FILMS | 2006年 / 515卷 / 04期

基金：

欧洲研究理事会;

关键词：

self-assembled monolayer; inkjet printing; wettability; soft lithography; x-ray photoelectron spectroscopy;

D O I：

10.1016/j.tsf.2006.07.003

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

To control the wettability of a silicon surface, mixed monolayers of 11-cyanoundecyltrichlorosilane (CN(CH2)(11)SiCl3) and dodecyltrichlorosilane (CH3(CH2)(11)SiCl3) in different ratios were fabricated using a simple wiping method. The surface of the wiped mixed monolayers was reproducibly homogeneous and smooth and the water wettability of wiped surfaces was controlled successfully with linear dependency, where the composition of the mixed monolayers matched the composition of the deposition solution in a direct 1: 1 fashion. From these results, the spread of the inkjet printed poly(3,4-ethylenedioxythiophene) doped with poly(styrene sulfonic acid) dots was controlled finely by the surface wettability of the wiped mixed monolayers. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：2079 / 2084

页数：6

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