Reaching the Theoretical Resonance Quality Factor Limit in Coaxial Plasmonic Nanoresonators Fabricated by Helium Ion Lithography

被引:108
作者
Melli, M. [1 ]
Polyakov, A. [1 ]
Gargas, D. [1 ]
Huynh, C. [2 ]
Scipioni, L. [2 ]
Bao, W. [1 ]
Ogletree, D. F. [1 ]
Schuck, P. J. [1 ]
Cabrini, S. [1 ]
Weber-Bargioni, A. [1 ]
机构
[1] Univ Calif Berkeley, Lawrence Berkeley Natl Lab, Mol Foundry, Berkeley, CA 94720 USA
[2] Carl Zeiss Microscopy LLC, Peabody, MA 01960 USA
关键词
Focus ion beam; helium ion microscope; coaxial apertures; plasmonics; nanofabrication; OPTICAL-TRANSMISSION; NANO-OPTICS; NANOPARTICLES; INDEX;
D O I
10.1021/nl400844a
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Optical antenna structures have revolutionized the field of nano-optics by confining light to deep subwavelength dimensions for spectroscopy and sensing. In this work, we fabricated coaxial optical antennae with sub-10-nanometer critical dimensions using helium ion lithography (HIL). Wavelength dependent transmission measurements were used to determine the wavelength-dependent optical response. The quality factor of 11 achieved with our HIL fabricated structures matched the theoretically predicted quality factor for the idealized flawless gold resonators calculated by finite-difference time-domain (FDTD). For comparison, coaxial antennae with 30 nm critical dimensions were fabricated using both HIL and the more common Ga focus ion beam lithography (Ga-FIB). The quality factor of the Ga-FIB resonators was 60% of the ideal HIL results for the same design geometry due to limitations in the Ga-FIB fabrication process.
引用
收藏
页码:2687 / 2691
页数:5
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