Effect of Cd2+ as a stabilizer in the electroless nickel plating system

被引:18
作者
Xiao, Zongyuan [1 ]
Wang, Wenjing [1 ]
Ye, Liyi [1 ]
Sha, Yong [1 ]
Tu, Song [1 ]
机构
[1] Xiamen Univ, Coll Chem & Chem Engn, Dept Chem & Biochem Engn, Fujian 361005, Peoples R China
基金
中国国家自然科学基金;
关键词
electroless nickel plating; stabilizer; plating rate; bath stability; corrosion resistance;
D O I
10.1016/j.surfcoat.2008.05.002
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Bath decomposition is a major problem in the electroless nickel (EN) plating system. Although the stabilization mechanism is far from being fully understood, bath stabilizers are normally added to extend the bath life in a viable EN plating solution. In this study, the effects ofCd" as a stabilizer on the plating rate, bath stability, and phosphorus content, corrosion resistance and microstructure of the deposits were investigated. The deposited films were examined using a scanning electron microscope (SEM) equipped with energy dispersive X-ray (EDX) spectroscopy and the X-ray photo spectroscopy (XPS). The electronic tunneling mechanism was used to elucidate the effect of the Cd2+ stabilizer on the plating system theoretically. The results calculated from theoretical method agreed well with the experimental data. (c) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:5008 / 5011
页数:4
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