Tunneling magnetoresistance in devices based on epitaxial NiMnSb with uniaxial anisotropy -: art. no. 036110

被引:2
|
作者
Liu, J [1 ]
Girgis, E
Bach, P
Rüster, C
Gould, C
Schmidt, G
Molenkamp, LW
机构
[1] Univ Wurzburg, Inst Phys, D-97074 Wurzburg, Germany
[2] Chinese Acad Sci, Inst Semicond, Engn Res Ctr Semicond Integrated Technol, Beijing 100083, Peoples R China
关键词
D O I
10.1063/1.2171782
中图分类号
O59 [应用物理学];
学科分类号
摘要
We demonstrate tunnel magnetoresistance junctions based on a trilayer system consisting of an epitaxial NiMnSb, an aluminum oxide, and a CoFe trilayer. The junctions show a tunneling magnetoresistance of Delta R/R of 8.7% at room temperature which increases to 14.7% at 4.2 K. The layers show a clear separate switching and a small ferromagnetic coupling. A uniaxial in-plane anisotropy in the NiMnSb layer leads to different switching characteristics depending on the direction in which the magnetic field is applied, an effect which can be used for sensor applications. (c) 2006 American Institute of Physics.
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