Photo-electrochemical Properties of Titanium Dioxide Thin Films Prepared by Reactive RF Sputtering Method

被引：0

作者：

Arita, Makoto ^{[1
]}

Tabata, Yu ^{[1
]}

Sakamoto, Hiroki ^{[1
]}

Guo, Qixin ^{[2
]}

机构：

[1] Kyushu Univ, Dept Mat Sci & Engn, 744 Motooka, Fukuoka 8190395, Japan

[2] Saga Univ, Dept Elect & Elect Engn, Synchrotron Light Applicat Ctr, Saga 8408502, Japan

来源：

ADVANCED MATERIALS SCIENCE AND TECHNOLOGY, (IFAMST-8) | 2013年 / 750卷

关键词：

Photo-electrochemistry; Titanium dioxide; Thin film; Reactive sputtering; Photocatalyst; PASSIVE FILMS; TIO2; ANATASE; ELECTRODE;

D O I：

10.4028/www.scientific.net/MSF.750.248

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The photo-electrochemical properties of photocatalytic titanium dioxide thin films obtained by reactive RE magnetron sputtering were investigated. The pressure during the sputtering deposition affected the photocatalytic activity and photo-induced hydrophilicity, and at 2 Pa the highest activities were observed. The photocurrent under ultraviolet light illumination corresponded to the photo-induced activities of the films. It is suggested that the band bending near the surface is one of the most crucial factors determines the activities of photo-induced behavior of the titanium dioxide thin films.

引用

页码：248 / +

页数：2

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