Production of Extremely Low Energy Electron Beam with Silicon-Based Field Emitter Arrays and Its Application to Space Charge Neutralization of Low-Energy and High-Current Ion Beam

被引：0

作者：

Gotoh, Yasuhito ^{[1
]}

Taguchi, Shuhei ^{[1
]}

Ikeda, Keita ^{[1
]}

Kitagawa, Takayuki ^{[1
]}

Tsuji, Hiroshi ^{[1
]}

Ishikawa, Junzo ^{[2
]}

Sakai, Shigeki ^{[3
]}

机构：

[1] Kyoto Univ, Dept Elect Sci & Engn, Kyoto, Japan

[2] Chubu Univ, Dept Informat Sci & Engn, Kasugai, Japan

[3] Nissin Ion Equipment Co Ltd, Kyoto, Japan

来源：

2012 25TH INTERNATIONAL VACUUM NANOELECTRONICS CONFERENCE (IVNC) | 2012年

关键词：

extremely low energy electron beam; field emitter array; space charge neutralization; low-energy and high-curent ion beam;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An electron beam with an energy as low as 5 eV and a current of 0.1 mA was produced by an electron source with a 10,000-tip silicon-based field emitter array (Si-FEA). In order to decelerate the electrons, we have designed an electrostatic lens system for the divergent beam extracted from the FEA. Spatial distribution of the electrons was investigated by a fluorescent screen with a multiple channel plate. Finally, space charge neutralization of low-energy and high-current ion beam was demonstrated with the present electron source.

引用

页码：86 / +

页数：2