Effect of negative dc substrate bias on morphology and adhesion of diamond coating synthesised on carbide turning tools by modified HFCVD method

被引：19

作者：

Chattopadhyay, A. ^{[1
]}

Sarangi, S. K. ^{[2
]}

Chattopadhyay, A. K. ^{[1
]}

机构：

[1] Indian Inst Technol, Dept Mech Engn, Kharagpur 721302, W Bengal, India

[2] Univ Coll Engn Burla, Dept Mech Engn, Sambalpur 768018, India

来源：

APPLIED SURFACE SCIENCE | 2008年 / 255卷 / 05期

关键词：

HFCVD diamond; Bias; Nucleation; Morphology; Adhesion;

D O I：

10.1016/j.apsusc.2008.04.065

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

One of the major steps in diamond deposition on tungsten carbide cutting tools by the CVD method is nucleation of diamond precursors on the substrate surface. Application of substrate biasing is one of the promising techniques for the enhancement of nucleation in HFCVD diamond coating. The objective of the present work is to study the effect of negative bias voltage to the substrate on the morphology and adhesion of the diamond coating to the substrate and to test the performance of the coated tool in machining. The beneficial effect of negative substrate bias at definite system pressure range towards achieving favourable coating having high nucleation density and good uniformity, ultimately leading to better machining performance has been confirmed. Crown Copyright (C) 2008 Published by Elsevier B. V. All rights reserved.

引用

页码：1661 / 1671

页数：11

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