Bimetallic thin film grayscale photomasks for complex 3D microstructure creation in SU-8

被引：0

作者：

Wang, Jun ^{[1
]}

Dykes, James M. ^{[1
]}

Choo, Chinheng ^{[1
]}

Poon, David K. ^{[1
]}

Chang, Marian ^{[1
]}

Tsui, Jimmy T. K. ^{[1
]}

Chapman, Glenn H. ^{[1
]}

机构：

[1] Simon Fraser Univ, Sch Engn Sci, Burnaby, BC V5A 1S6, Canada

来源：

2007 CANADIAN CONFERENCE ON ELECTRICAL AND COMPUTER ENGINEERING, VOLS 1-3 | 2007年

关键词：

grayscale photomasks; bimetallic thin film; laser-induced oxidation; SU-8;

D O I：

暂无

中图分类号：

TP39 [计算机的应用];

学科分类号：

081203 ; 0835 ;

摘要：

Metallic thin films can be fully oxidized by focused laser beams, resulting in their optical density (013) changing from highly absorbing to very transparent. Previous research found the laser-induced partial oxidation process allows the creation of grayscale photomasks. This work investigates Sn/Zn, Zn/Al and In/Zn thin films, which are DC/RF-sputter deposited and then scanned by an argon ion CW laser. The resulting transmittance for the mask varies from 0.06% (3.2OD) to 63% (0.2OD), offering a greater range of transparency at I-line (365nm) than existing commercial grayscale masks such as chrome halftone binary and analog HEBS photomasks. Having 8-bit gray level precision, bimetallic films are capable of producing complex 3D microstructures using only a single exposure. Using SU-8, a thick negative photoresist, along with standard photolithography, microfeatures with height variations up to 100 mu m were successfully generated.

引用

页码：959 / 962

页数：4

共 16 条

[1]

[Anonymous], 2005, PHOTOMASK FABRICATIO

[2] Enhanced inorganic bimetallic thermal resists transparency and resolution for photomask fabrication [J].

Chapman, G ;

Poon, D ;

Choo, C ;

Tu, Y ;

Dykes, J ;

Wang, J ;

Peng, J ;

Lennard, W ;

Kavanagh, K .

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XXII, PT 1 AND 2, 2005, 5753 :976-987

[3]

CHAPMAN G, 2005, P SOC PHOTO-OPT INS, V5713, P246

[4]

CHEN C, 2003, GRAY SCALE PHOTOLITH, P1499

[5] Improved patterning quality of SU-8 microstructures by optimizing the exposure parameters [J].

Ling, ZG ;

Lian, K ;

Jian, LK .

ADVANCES IN RESIST TECHNOLOGY AND PROCESSING XVII, PTS 1 AND 2, 2000, 3999 :1019-1027

[6]

MARTIN A, 2003, Patent No. 6635412

[7] Continuous tone gray-scale photomask for deep UV lithography applications [J].

Mendoza, EA ;

Sigoli, F ;

Paulus, H ;

Giang, LQ ;

Seifouri, M ;

Lam, E ;

Kempen, L .

OPTICAL MICROLITHOGRAPHY XVII, PTS 1-3, 2004, 5377 :1059-1064

[8] Calibrating grayscale direct write bimetallic photomasks to create 3D photoresist structures [J].

Tu, YQ ;

Chapman, G ;

Dykes, J ;

Poon, D ;

Choo, CH ;

Peng, J .

24TH ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PT 1 AND 2, 2004, 5567 :245-256

[9]

WANG J, 2006, P SPIE, V6016

[10]

WU C, Patent No. 4894303

← 1 2 →