Size-dependent characteristics of indium-seeded Si nanowire growth

被引:17
|
作者
Iacopi, F. [1 ]
Richard, O. [1 ]
Eichhammer, Y. [1 ,2 ]
Bender, H. [1 ]
Vereecken, P. M. [1 ]
De Gendt, S. [1 ,3 ]
Heyns, M. [1 ,2 ]
机构
[1] IMEC, B-3001 Louvain, Belgium
[2] Katholieke Univ Leuven, MTM Dept, B-3001 Louvain, Belgium
[3] Katholieke Univ Leuven, Dept Chem, B-3001 Louvain, Belgium
关键词
D O I
10.1149/1.2945800
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
Si nanowires were grown by a vapor-liquid-solid mechanism using indium catalyst particles with sizes between 10 and 200 nm. Transmission electron microscopy analysis indicates that the growth morphology of the nanostructures changes drastically when the particle size is only a few tens of nanometers. The larger wires are monocrystalline, growing with < 111 > orientation and limited tapering. The simultaneously grown smaller wires appear strongly tapered, due to an accumulation of amorphous Si on the sidewalls, and present a poor crystalline quality. A model based on the solubility of Si in the In-Si eutectic is proposed to account for the size-dependent change of morphology. (C) 2008 The Electrochemical Society.
引用
收藏
页码:K98 / K100
页数:3
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