Characterization of mc-Si directionally solidified in travelling magnetic fields

被引:35
作者
Kiessling, F. -M. [1 ]
Buellesfeld, F. [2 ]
Dropka, N. [1 ]
Frank-Rotsch, Ch. [1 ]
Mueller, M. [3 ]
Rudolph, P. [4 ]
机构
[1] Leibniz Inst Kristallzuchtung IKZ, D-12489 Berlin, Germany
[2] Schott AG, D-55122 Mainz, Germany
[3] Schott Solar Wafer GmbH, D-07743 Jena, Germany
[4] CTC, D-12529 Schonefeld, Germany
关键词
Directional solidification; Magnetic fields; Impurities; Vertical gradient freeze; Multi-crystalline silicon; MULTICRYSTALLINE SILICON; DEFECTS; GROWTH; GENERATION; NITROGEN; MELT;
D O I
10.1016/j.jcrysgro.2012.03.017
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
Solar-grade boron doped silicon has been directionally solidified in a vertical gradient freeze-type furnace equipped with KRISTMAG (R)-heaters to study the influence of travelling magnetic fields (TMFs) on the ingot quality. As-grown silicon ingots of 22 x 22 x 13 cm(3) in volume were cut vertically and analysed. Information was obtained on the curvature of the melt-solid interface, the grain size distribution, the content of SiC and Si3N4 particles and the electrical activity of defects. TMFs were used to enhance melt stirring and to control the growth interface shape. Primarily inclusion-free ingots were solidified with grains of several centimetres in size. Minority carrier lifetimes of tau=20-30 mu s were measured on polished surfaces of cuts from as-grown ingots. The concentrations of carbon, oxygen and nitrogen were determined by FTIR spectroscopy to (3-4) x 10(17) atoms/cm(3), (2-3) x 10(17) atoms/cm(3) and (0.6-2) x 10(15) atoms/cm(3), respectively. Mean etch pit densities were evaluated on vertical cuts as low as (2-3) x 10(3) cm(-2). (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:81 / 86
页数:6
相关论文
共 32 条
[1]   The impact of germanium doping on the dislocation distribution in directional solidified mc-silicon [J].
Bellmann, M. P. ;
Kaden, T. ;
Kressner-Kiel, D. ;
Friedl, J. ;
Moeller, H. J. ;
Arnberg, L. .
JOURNAL OF CRYSTAL GROWTH, 2011, 325 (01) :1-4
[2]   Impurity segregation in directional solidified multi-crystalline silicon [J].
Bellmann, M. P. ;
Meese, E. A. ;
Arnberg, L. .
JOURNAL OF CRYSTAL GROWTH, 2010, 312 (21) :3091-3095
[3]   Electronically activated boron-oxygen-related recombination centers in crystalline silicon [J].
Bothe, K ;
Schmidt, J .
JOURNAL OF APPLIED PHYSICS, 2006, 99 (01)
[4]   Fundamental boron-oxygen-related carrier lifetime limit in mono- and multicrystalline silicon [J].
Bothe, K ;
Sinton, R ;
Schmidt, J .
PROGRESS IN PHOTOVOLTAICS, 2005, 13 (04) :287-296
[5]  
Breitenstein Otwin, 2010, Diffusion and Defect Data Part B (Solid State Phenomena), V156-8, P1, DOI 10.4028/www.scientific.net/SSP.156-158.1
[6]   An optical microscopy study of dislocations in multicrystalline silicon grown by directional solidification method [J].
Chen, Nan ;
Qiu, Shenyu ;
Liu, Bingfa ;
Du, Guoping ;
Liu, Guihua ;
Sun, Wei .
MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2010, 13 (04) :276-280
[7]   Model experiments and numerical simulations for directional solidification of multicrystalline silicon in a traveling magnetic field [J].
Dadzis, K. ;
Ehrig, J. ;
Niemietz, K. ;
Paetzold, O. ;
Wunderwald, U. ;
Friedrich, J. .
JOURNAL OF CRYSTAL GROWTH, 2011, 333 (01) :7-15
[8]   Numerical study on transport phenomena in a directional solidification process in the presence of travelling magnetic fields [J].
Dropka, Natasha ;
Miller, Wolfram ;
Menzel, Robert ;
Rehse, Uwe .
JOURNAL OF CRYSTAL GROWTH, 2010, 312 (08) :1407-1410
[9]   Growth mechanism of Si-faceted dendrites [J].
Fujiwara, K. ;
Maeda, K. ;
Usami, N. ;
Nakajima, K. .
PHYSICAL REVIEW LETTERS, 2008, 101 (05)
[10]   Crystal growth of high-purity multicrystalline silicon using a unidirectional solidification furnace for solar cells [J].
Gao, B. ;
Chen, X. J. ;
Nakano, S. ;
Kakimoto, K. .
JOURNAL OF CRYSTAL GROWTH, 2010, 312 (09) :1572-1576