First-principles X-ray photoelectron spectroscopy binding energy shift calculation for boron and aluminum defects in 3C-silicon carbide

被引:8
作者
Matsushima, Naoki [1 ,2 ]
Yamauchi, Jun [1 ]
机构
[1] Keio Univ, Fac Sci & Technol, Kohoku Ku, Yokohama, Kanagawa 2238522, Japan
[2] SUMCO Corp, Technol Div, Imari, Saga 8494256, Japan
关键词
SILICON-CARBIDE; IMPURITIES;
D O I
10.7567/1347-4065/aafc52
中图分类号
O59 [应用物理学];
学科分类号
摘要
We systematically investigated the core-level X-ray photoelectron spectroscopy (XPS) binding energy shifts of B 1s and Al 2p and formation energies for defects including boron and aluminum in 3C-silicon carbide (SiC) by first-principles calculation. We analyzed the relation between the XPS binding energy shift and defect states and found that the defects with localized electrons in the band gap or energy gap in the valence band have larger XPS relaxation energies (XPSREs) than those without localized electrons. In contrast, spread electrons and electrons localized away from the core hole hardly affect the XPSREs. Further, we analyzed the dependence on crystal matrices, that is, elemental and compound semiconductors, on XPS spectra by comparing the XPS spectra of Si and 3C-SiC. Although the variation of the local potential in 3C-SiC is larger than that in Si, the variations of their relaxation energies are comparable. (C) 2019 The Japan Society of Applied Physics
引用
收藏
页数:10
相关论文
共 33 条
[1]  
BAKKE AA, 1980, J ELECTRON SPECTROSC, V20, P333, DOI 10.1016/0368-2048(80)85030-4
[2]   Different roles of carbon and silicon interstitials in the interstitial-mediated boron diffusion in SiC [J].
Bockstedte, M ;
Mattausch, A ;
Pankratov, O .
PHYSICAL REVIEW B, 2004, 70 (11) :115203-1
[3]   Boron in SiC: Structure and kinetics [J].
Bockstedte, M ;
Mattausch, A ;
Pankratov, O .
SILICON CARBIDE AND RELATED MATERIALS, ECSCRM2000, 2001, 353-356 :447-450
[4]   Diffusion of boron in silicon carbide: Evidence for the kick-out mechanism [J].
Bracht, H ;
Stolwijk, NA ;
Laube, M ;
Pensl, G .
APPLIED PHYSICS LETTERS, 2000, 77 (20) :3188-3190
[5]  
Chase Jr M. W., 1998, THERMOCHEMICAL TABLE, P648
[6]   STATE OF BORON IN CHEMICAL VAPOR-DEPOSITED SIC-B COMPOSITE POWDERS [J].
CHEN, L ;
GOTO, T ;
HIRAI, T ;
AMANO, T .
JOURNAL OF MATERIALS SCIENCE LETTERS, 1990, 9 (09) :997-999
[7]   First-principles calculations of p-type impurities in cubic SiC [J].
Fukumoto, A .
PHYSICAL REVIEW B, 1996, 53 (08) :4458-4461
[8]  
Humphreys R. G., 1980, Journal of the Physical Society of Japan, V49, P519
[9]   Excellent reverse blocking characteristics of high-voltage 4H-SiC Schottky rectifiers with boron-implanted edge termination [J].
Itoh, A ;
Kimoto, T ;
Matsunami, H .
IEEE ELECTRON DEVICE LETTERS, 1996, 17 (03) :139-141
[10]   PERIODIC BOUNDARY-CONDITIONS IN AB-INITIO CALCULATIONS [J].
MAKOV, G ;
PAYNE, MC .
PHYSICAL REVIEW B, 1995, 51 (07) :4014-4022