Multi-Beam Interference Advances and Applications: Nano-Electronics, Photonic Crystals, Metamaterials, Subwavelength Structures, Optical Trapping, and Biomedical Structures

被引:91
作者
Burrow, Guy M. [1 ]
Gaylord, Thomas K. [1 ]
机构
[1] Georgia Inst Technol, Sch Elect & Comp Engn, Atlanta, GA 30332 USA
基金
美国国家科学基金会;
关键词
multi-beam interference; interference lithography; nano-electronics; photonic crystals; metamaterials; subwavelength structures; optical trapping; biomedical structures; DIFFRACTIVE BEAM SPLITTER; 3-D HOLOGRAPHIC LITHOGRAPHY; SURFACE-RELIEF GRATINGS; 3 NONCOPLANAR BEAMS; 14 BRAVAIS LATTICES; LASER INTERFERENCE; BAND-GAP; LARGE-AREA; INTERFEROMETRIC LITHOGRAPHY; PERIODIC STRUCTURES;
D O I
10.3390/mi2020221
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
Research in recent years has greatly advanced the understanding and capabilities of multi-beam interference (MBI). With this technology it is now possible to generate a wide range of one-, two-, and three-dimensional periodic optical-intensity distributions at the micro-and nano-scale over a large length/area/volume. These patterns may be used directly or recorded in photo-sensitive materials using multi-beam interference lithography (MBIL) to accomplish subwavelength patterning. Advances in MBI and MBIL and a very wide range of applications areas including nano-electronics, photonic crystals, metamaterials, subwavelength structures, optical trapping, and biomedical structures are reviewed and put into a unified perspective.
引用
收藏
页码:221 / 257
页数:37
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