Pathways toward higher performance CdS/CdTe devices: Te exposure of CdTe surface before ZnTe:Cu/Ti contacting

被引:13
作者
Gessert, T. A. [1 ]
Burst, J. M. [1 ]
Wei, S. -H. [1 ]
Ma, J. [1 ]
Kuciauskas, D. [1 ]
Rance, W. L. [1 ]
Barnes, T. M. [1 ]
Duenow, J. N. [1 ]
Reese, M. O. [1 ]
Li, J. V. [1 ]
Young, M. R. [1 ]
Dippo, P. [1 ]
机构
[1] Natl Renewable Energy Lab, Golden, CO 80401 USA
关键词
CdTe; ZnTe; Contacts; Stoichiometry;
D O I
10.1016/j.tsf.2012.11.087
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Many studies of thin-film CdS/CdTe photovoltaic devices have suggested that performance may be improved by reducing recombination due to Te-vacancy (V-Te), Te antisite (Te-Cd), or Te-interstitial (Te-i) defects. Although formation of these intrinsic defects is likely influenced by CdTe deposition parameters, it may be also coupled to the formation of beneficial cadmium vacancy (V-Cd) defects. In this study, we expose the CdTe surface to Te vapor prior to ZnTe:Cu/Ti contact-interface formation with the goal of reducing V-Te without significantly reducing VCd. Initial results show that when this modified contact is used on a CdCl2-treated CdS/CdTe device, poorer device performance results. This suggests two things: First, the amount of free-Te available during contact formation (either from chemical etching or CuxTe or ZnTe deposition) may be a more important parameter to device performance than previously appreciated. Second, if processes have been used to reduce the effect of V-Te (e.g., oxygen and chlorine additions), adding even a small amount of Te may produce detrimental defects. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:237 / 240
页数:4
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