Effects of Ion Bombardment on Magnetostrictive Properties of Giant Magnetostrictive Thin Films

被引：5

作者：

Makita, Koji ^{[1
]}

Tanakamaru, Tempei ^{[1
]}

Takeuchi, Mitsuaki ^{[1
]}

Uchida, Hirohisa ^{[1
]}

Matsumura, Yoshihito ^{[1
]}

机构：

[1] Tokai Univ, Grad Sch Engn, Dept Appl Sci, Hiratsuka, Kanagawa 2591292, Japan

来源：

JOURNAL OF THE JAPAN INSTITUTE OF METALS | 2008年 / 72卷 / 09期

关键词：

giant magnetostriction; thin film; ion bombardment; internal stress; magnetostrictive susceptibility;

D O I：

10.2320/jinstmet.72.714

中图分类号：

TF [冶金工业];

学科分类号：

0806 ;

摘要：

Sm27Fe73 films fabricated by a magnetron sputtering were studied with respect to magnetism and plasma physics. A new parameter 'P-i' was proposed to evaluate effects of ion bombardment for a magnetostriction. The P-i is represented as P-i = (i/a).(2m(i)E(i))(1/2), here i is ion flux, a is material flux, m(i) is the ion mass and E-i is the ion energy. The plasma parameter was determined by Langmuir probes. As a result, the inplane magnetic anisotropy was enhanced by increasing of the P-i. Increase of the P-i induced an increase of magnetostrictive susceptibility and a decrease of saturated magnetstriction. This is probably caused by a change of internal stress accompanied with the P-i.

引用

页码：714 / 718

页数：5

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