Effects of Ion Bombardment on Magnetostrictive Properties of Giant Magnetostrictive Thin Films

被引：5
|
作者：
Makita, Koji [1 ]
Tanakamaru, Tempei [1 ]
Takeuchi, Mitsuaki [1 ]
Uchida, Hirohisa [1 ]
Matsumura, Yoshihito [1 ]
机构：
[1] Tokai Univ, Grad Sch Engn, Dept Appl Sci, Hiratsuka, Kanagawa 2591292, Japan
来源：
JOURNAL OF THE JAPAN INSTITUTE OF METALS | 2008年 / 72卷 / 09期
关键词：
giant magnetostriction; thin film; ion bombardment; internal stress; magnetostrictive susceptibility;
D O I：
10.2320/jinstmet.72.714
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
Sm27Fe73 films fabricated by a magnetron sputtering were studied with respect to magnetism and plasma physics. A new parameter 'P-i' was proposed to evaluate effects of ion bombardment for a magnetostriction. The P-i is represented as P-i = (i/a).(2m(i)E(i))(1/2), here i is ion flux, a is material flux, m(i) is the ion mass and E-i is the ion energy. The plasma parameter was determined by Langmuir probes. As a result, the inplane magnetic anisotropy was enhanced by increasing of the P-i. Increase of the P-i induced an increase of magnetostrictive susceptibility and a decrease of saturated magnetstriction. This is probably caused by a change of internal stress accompanied with the P-i.
引用
收藏
页码：714 / 718
页数：5
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