A method to quantify the degree of uniformity of thickness of thin films

被引:9
|
作者
Roncallo, S. [1 ]
Painter, J. D. [1 ]
Cousins, M. A. [1 ]
Lane, D. W. [1 ]
Rogers, K. D. [1 ]
机构
[1] Cranfield Univ, Dept Mat & Appl Sci, DCMT, Swindon SN6 8LA, Wilts, England
基金
英国工程与自然科学研究理事会;
关键词
Electrospray deposition; Coating uniformity; Chalcogenides; Surface roughness; Optical density;
D O I
10.1016/j.tsf.2008.05.001
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A method for determining the uniformity of as-deposited thin films is presented. Thin films were deposited by electrostatic spray deposition from a water-alcohol based solution. This coating method relies on the application of an electric field to generate an aerosol which subsequently undergoes electrostatic attraction to a high temperature substrate. Semi-transparent chalcopyrite films produced in this way were illuminated by a light box and images subsequently captured by a digital camera were employed in a simple test to quantify the uniformity of the samples. The effect of experimental parameters, such as voltage, precursor solution flow rate and needle-substrate distance were studied with this test. The effect of each parameter has been analysed in order to optimize the uniformity of the deposited films. The results show that this simple and rapid method is capable of quantifying the degree of uniformity using a simple image analysis process. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:8493 / 8497
页数:5
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