SYNTHESIS OF ZIRCONIUM OXYNITRIDE (ZrON) NANOCOMPOSITE FILMS ON ZIRCONIUM SUBSTRATE BY DENSE PLASMA FOCUS DEVICE

被引:10
作者
Khan, I. A. [1 ]
Hassan, M. [1 ]
Ahmad, R. [1 ]
Murtaza, G. [2 ]
Zakaullah, M. [3 ]
Rawat, R. S. [4 ]
Lee, P. [4 ]
机构
[1] Govt Coll Univ, Dept Phys, Lahore 54000, Pakistan
[2] Govt Coll Univ, Salam Chair Phys, Lahore 54000, Pakistan
[3] Quaid I Azam Univ, Dept Phys, Islamabad 45320, Pakistan
[4] Nanyang Technol Univ, Natl Inst Educ, Singapore 637616, Singapore
来源
INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2008年 / 22卷 / 23期
关键词
Zirconium oxynitride; nanocomposite; ZrN; Zr3N4 and ZrO2; ion energy flux; microhardness and dense plasma focus;
D O I
10.1142/S0217979208048905
中图分类号
O59 [应用物理学];
学科分类号
摘要
Nanocrystalline zirconium nitride/oxide "zirconium oxynitride" nanocomposite film is deposited on zirconium substrate by dense plasma focus device at room temperature. Xray diffraction of irradiated samples reveals that different phases (ZrN, Zr3N4 and ZrO2) of zirconium nitride and zirconium oxide are evolved. The crystallinity of these phases depends on axial positions as well as ion energy flux. Scanning electron microscopy shows that the deposited film is more compact at lower axial position, which is due to higher ion energy flux. Energy dispersive X-rays spectroscopy shows that the presence of nitrogen concentration decreases by increasing the axial position. Maximum microhardness value for the deposited layer is found to be 7200 +/- 12 MPa at 10 gram imposed load.
引用
收藏
页码:3941 / 3955
页数:15
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