Thermal annealing effect on physical properties of DNA-CTMA thin films

被引：7
作者：
Niziol, Jacek [1 ]
Dendzik, Maciej [2 ]
Sitarz, Maciej [3 ]
Hebda, Edyta [4 ]
Pielichowski, Jan [4 ]
Lojewska, Joanna [5 ]
Rogulska, Anna [5 ]
Bakasse, Mina [6 ]
机构：
[1] AGH Univ Sci & Technol, Fac Phys & Appl Comp Sci, PL-30059 Krakow, Poland
[2] Jagiellonian Univ, Inst Phys, PL-30059 Krakow, Poland
[3] AGH Univ Sci & Technol, Fac Mat Sci & Ceram, PL-30059 Krakow, Poland
[4] Krakow Tech Univ, Dept Chem & Technol Polymers, PL-31155 Krakow, Poland
[5] Jagiellonian Univ, Fac Chem, PL-30060 Krakow, Poland
[6] Univ Chouaib Doukkali, Fac Sci, El Jadida 24000, Morocco
来源：
OPTICAL MATERIALS | 2013年 / 36卷 / 01期
关键词：
DNA-CTMA; Thin films; Organic electronics; Ellipsometry; Dielectric spectroscopy; REHYDRATION;
D O I：
10.1016/j.optmat.2013.06.022
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
DNA-CTMA is a material of increasing interest in the domain of organic electronics and photonics. However, its physical properties are not sufficiently understood. In this work DNA-CTMA thin films were subjected to thermal annealing. Annealing courses was monitored in situ by spectroscopic ellipsometry, infrared spectroscopy and dielectric spectroscopy. The results suggest existence of an irreversible structural transition, occurring at a temperature adjacent to 150 degrees C. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：36 / 41
页数：6
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