The effect of RF power on the electrochromic response time of sputter-deposited Ni oxide films

被引：16

作者：

Ahn, KS ^{[1
]}

Nah, YC ^{[1
]}

Sung, YE ^{[1
]}

机构：

[1] Kwangju Inst Sci & Technol, Dept Mat Sci & Engn, Kwangju 500712, South Korea

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 2002年 / 41卷 / 5A期

关键词：

electrochromism; Ni oxide; transmittance; sputter; RF power;

D O I：

10.1143/JJAP.41.L533

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The effect of RF power on (he electrochromic properties and response time of Ni oxide films grown by RF magnetron sputtering were investigated by in situ transmittance measurements with continuous potential cycling and a pulse potential cycling test. Although the coloration efficiency and crystallographic structure were independent of RF power, transmittance difference, transient cycling period. charge density. and response time during coloring/bleaching process were significantly affected. This can be attributed to the presence of electrochromic inactive components. produced as the result of the fast growth rate, high RF power, and low film density.

引用

页码：L533 / L535

页数：3

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