Extended x-ray absorption fine structure measurements on asymmetric bipolar pulse direct current magnetron sputtered Ta2O5 thin films

被引：18

作者：

Haque, S. Maidul ^{[1
]}

Sagdeo, Pankaj R. ^{[2
,3
]}

Shinde, D. D. ^{[1
]}

Misal, J. S. ^{[1
]}

Jha, S. N. ^{[4
]}

Bhattacharyya, D. ^{[4
]}

Sahoo, N. K. ^{[4
]}

机构：

[1] Bhabha Atom Res Ctr, Atom & Mol Phys Div, VIZAG Ctr, Visakhapatnam 530012, Andhra Pradesh, India

[2] Indian Inst Technol Indore, Discipline Phys, Indore 452017, Madhya Pradesh, India

[3] Indian Inst Technol Indore, Ctr Mat Sci & Engn, Indore 452017, Madhya Pradesh, India

[4] Bhabha Atom Res Ctr, Atom & Mol Phys Div, Bombay 400094, Maharashtra, India

来源：

APPLIED OPTICS | 2015年 / 54卷 / 22期

关键词：

OPTICAL-PROPERTIES; TEMPERATURE;

D O I：

10.1364/AO.54.006744

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Tantalum pentoxide (Ta2O5) thin films have been deposited on fused silica substrates using a novel asymmetric bipolar DC magnetron sputtering technique under a mixed ambient of oxygen and argon. Films have been prepared at different oxygen-to-argon ratios, and the sputtering ambient and optical properties of the films have been investigated by spectroscopic ellipsometry, while the structural analysis of the films has been carried out by grazing incidence x-ray diffraction and extended x-ray absorption fine structure (EXAFS) measurements. The concentration of oxygen and tantalum in the Ta2O5 films has been estimated by Rutherford backscattering spectrometry (RBS). The variation of the optical constants of the films with changes in deposition parameters has been explained in the light of the change in average Ta-O bond lengths and oxygen coordination around Ta sites as obtained from EXAFS measurements. The trend in variation of the oxygen-to-tantalum ratio in the films obtained from RBS measurement, as a function of oxygen partial pressure used during sputtering, is found to follow the trend in variation of the oxygen coordination number around Ta sites obtained from EXAFS measurement. (C) 2015 Optical Society of America

引用

页码：6744 / 6751

页数：8

共 29 条

[1] Rietveld analysis of X-ray diffraction pattern from β-Ta2O5 oxide [J].

Aleshina, LA ;

Loginova, SV .

CRYSTALLOGRAPHY REPORTS, 2002, 47 (03) :415-419

[2] Structure and optical analysis of Ta2O5 deposited on infrasil substrate [J].

Azim, Osama A. ;

Abdel-Aziz, M. M. ;

Yahia, I. S. .

APPLIED SURFACE SCIENCE, 2009, 255 (09) :4829-4835

[3]

Azzam R. M. A., 1977, Ellipsometry and Polarized Light

[4] A comprehensive facility for EXAFS measurements at the INDUS-2 synchrotron source at RRCAT, Indore, India [J].

Basu, S. ;

Nayak, C. ;

Yadav, A. K. ;

Agrawal, A. ;

Poswal, A. K. ;

Bhattacharyya, D. ;

Jha, S. N. ;

Sahoo, N. K. .

17TH PAN-AMERICAN SYNCHROTRON RADIATION INSTRUMENTATION CONFERENCE SRI2013, 2014, 493

[5] Processing and characterisation of sol-gel deposited Ta2O5 and TiO2-Ta2O5 dielectric thin films [J].

Cappellani, A ;

Keddie, JL ;

Barradas, NP ;

Jackson, SM .

SOLID-STATE ELECTRONICS, 1999, 43 (06) :1095-1099

[6]

CHEN GP, 1990, VACUUM, V41, P1204, DOI 10.1016/0042-207X(90)93911-2

[7] Correlation between local structure and refractive index of e-beam evaporated (HfO2-SiO2) composite thin films [J].

Das, N. C. ;

Sahoo, N. K. ;

Bhattacharyya, D. ;

Thakur, S. ;

Kamble, N. M. ;

Nanda, D. ;

Hazra, S. ;

Bal, J. K. ;

Lee, J. F. ;

Tai, Y. L. ;

Hsieh, C. A. .

JOURNAL OF APPLIED PHYSICS, 2010, 108 (02)

[8]

Edwards D.F., 1985, Handbook of optical constants of solids

[9]

Fujiwara H., 2003, SPECTROSCOPIC ELLIPS

[10] Study of Optical Properties of Asymmetric Bipolar Pulse DC Magnetron Sputtered Ta2O5 Thin Film as a Function of Oxygen Content in Deposition Ambient [J].

Haque, S. Maidul ;

Shinde, D. D. ;

Misal, J. S. ;

Bhattacharyya, D. ;

Sahoo, N. K. .

SOLID STATE PHYSICS: PROCEEDINGS OF THE 58TH DAE SOLID STATE PHYSICS SYMPOSIUM 2013, PTS A & B, 2014, 1591 :858-860

← 1 2 3 →