ULTRATHIN METAL FILM: AN EMERGING TRANSPARENT ELECTRODE FOR THE OPTOELECTRONICS INDUSTRY

被引：4

作者：

Martinez, L. ^{[1
]}

Ghosh, D. S. ^{[1
]}

Giurgola, S. ^{[2
]}

Vergani, P. ^{[2
]}

Pruneri, V. ^{[1
,3
]}

机构：

[1] ICFO Inst Ciencies Foton, Castelldefels 08860, Spain

[2] Avanex Corp, I-20097 San Donato Milanese, Italy

[3] ICREA, E-08010 Barcelona, Spain

来源：

CAOL 2008: PROCEEDINGS OF THE 4TH INTERNATIONAL CONFERENCE ON ADVANCED OPTOELECTRONICS AND LASERS | 2008年

关键词：

transparent electrode; sputtering; electrical conductivity; optical transmittance; ultrathin metals; transparent conductive oxides;

D O I：

10.1109/CAOL.2008.4671928

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Ultrathin Metal Films are increasingly becoming important for applications where transparent and conductive electrodes are required. With respect to the widely used transparent conductive oxides, Such as indium tin oxide, they can overcome the strong ultraviolet absorption and incompatibility with some organic materials. In this paper we report the successful deposition of sputtered nickel films, whose electrical and optical responses have been studied using four point probe method and spectrometry respectively. Sufficiently thin nickel layers can possess similar levels of transparency in the visible range, larger ultraviolet transmittance and larger electrical conductivity than indium tin oxide layers. These results, together with the observed temperature stability, confirm that ultra thin metal films are serious competitors to transparent conductive oxides.

引用

页码：15 / +

页数：2