Femtosecond laser ablation of CaF2: Plasma characterization and thin films deposition

被引：10
|
作者：
De Bonis, A. [1 ]
Santagata, A. [2 ]
Galasso, A. [1 ]
Sansone, M. [1 ]
Teghil, R. [1 ]
机构：
[1] Univ Basilicata, Dipartimento Sci, I-85100 Potenza, Italy
[2] CNR, UOS Potenza, Ist Metodol Inorgan & Plasmi, I-85050 Tito, Italy
来源：
APPLIED SURFACE SCIENCE | 2014年 / 302卷
关键词：
Calcium fluoride; Ultra-short pulse laser; Pulsed laser deposition; Nanoparticles; CALCIUM-FLUORIDE; POLISHED CAF2; NANOSECOND; DAMAGE; DIELECTRICS; SUBLIMATION; DESORPTION; PRESSURE; SURFACES; CARBIDE;
D O I：
10.1016/j.apsusc.2013.09.089
中图分类号：
O64 [物理化学（理论化学）、化学物理学];
学科分类号：
070304 ; 081704 ;
摘要：
Nanostructured thin films of CaF2 have been deposited in vacuum by ultra-short pulse laser ablation. The laser-induced plasma, characterized by optical emission spectroscopy and ICCD fast imaging, shows the presence of Ca and F atomic species, neutral and ionized, together with the CaF molecular species. Although continuous blackbody-like emission has not been detected from the plasma, the deposited films, characterized by Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy, are apparently formed by the coalescence of a large number of nanoparticles composed by stoichiometric CaF2. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码：145 / 148
页数：4
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