Formation of microcraters on plant cell wall by plasma immersion ion implantation

被引:0
|
作者
Huang, Q. J. [1 ]
Sun, H. [1 ]
Huang, N. [1 ]
Maitz, M. F. [1 ,2 ]
Brown, I. G. [3 ]
机构
[1] Southwest Jiaotong Univ, Sch Mat Sci & Engn, Chengdu 610031, Peoples R China
[2] Max Bergmann Ctr Biomat, Leibniz Inst Polymer Res Dresden, Dresden, Germany
[3] Lawrence Berkeley Natl Lab, Berkeley, CA 94720 USA
来源
SURFACE & COATINGS TECHNOLOGY | 2013年 / 229卷
基金
中国国家自然科学基金;
关键词
Cell wall; Microcrater; Ion implantation; Plasma immersion; BOMBARDMENT; SURFACE;
D O I
10.1016/j.surfcoat.2012.05.047
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Ion bombardment of biological cellular material has been used as a tool for the transfer of exogenous DNA macromolecules into the cell interior region. The precise physical mechanisms associated with this transfer of macromolecules through the cell envelope remain unexplained, however it has been observed that the ion bombardment is accompanied by the formation of "microcraters" on the wall of plant cells, and it is possible that these features provide channels for the macromolecule transfer. Thus the nature and origin of the microcraters are of importance to understanding the DNA transfer phenomenon as well as being of fundamental interest. We report here on the formation of microcraters on onion skin cell walls by plasma immersion ion implantation (Pill) using similar to 20 key Ar+ ions at a dose of about 1x10(15)ions/cm(2). The results indicate that Pill provides a tool for carrying out ion bombardment of living biological materials previously done using beam-line implantation methods. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:197 / 199
页数:3
相关论文
共 50 条
  • [21] Treatment of polymers by plasma immersion ion implantation for space applications
    Tan, IH
    Ueda, M
    Dallaqua, RS
    Rossi, JO
    Beloto, AF
    Tabacniks, MH
    Demarquette, NR
    Inoue, Y
    SURFACE & COATINGS TECHNOLOGY, 2004, 186 (1-2): : 234 - 238
  • [22] Electrical effects of nitrogen plasma immersion ion implantation on silicon
    Chen, SM
    Shannon, JM
    Gwilliam, RM
    Sealy, BJ
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1997, 127 : 901 - 904
  • [23] AN EVALUATION OF CONTAMINATION FROM PLASMA IMMERSION ION-IMPLANTATION ON SILICON DEVICE CHARACTERISTICS
    QIN, S
    CHAN, C
    JOURNAL OF ELECTRONIC MATERIALS, 1994, 23 (03) : 337 - 340
  • [24] Antibacterial response of titanium oxide coatings doped by nitrogen plasma immersion ion implantation
    Esparza, Joseba
    Garcia Fuentes, Gonzalo
    Bueno, Rebeca
    Rodriguez, Rafael
    Antonio Garcia, Jose
    Isabel Vitas, Ana
    Rico, Victor
    Gonzalez-Elipe, Agustin R.
    SURFACE & COATINGS TECHNOLOGY, 2017, 314 : 67 - 71
  • [25] Plasma immersion ion implantation treatment of polyethylene for enhanced binding of active horseradish peroxidase
    Gan, B. K.
    Nosworthy, N. J.
    McKenzie, D. R.
    dos Remedios, C. G.
    Bilek, M. M. M.
    JOURNAL OF BIOMEDICAL MATERIALS RESEARCH PART A, 2008, 85A (03) : 605 - 610
  • [26] Investigation of Plasma Immersion Ion Implantation Process in Magnetic Mirror Geometry
    de Dios Mitma Pillaca, Elver Juan
    Ueda, Mario
    Kostov, Konstantin Georgiev
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) : 3049 - 3055
  • [27] Numerical simulation of magnetic field enhanced plasma immersion ion implantation
    Kostov, K. G.
    Barroso, J. J.
    Ueda, M.
    SURFACE & COATINGS TECHNOLOGY, 2007, 201 (19-20): : 8398 - 8402
  • [28] Electrical characterization of silicon nitride produced by plasma immersion ion implantation
    Chen, SM
    Shannon, JM
    Gwilliam, RM
    Sealy, BJ
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 269 - 273
  • [29] Plasma Immersion Ion Implantation of the Pea Seed and Its RBS Spectra
    何国兴
    吴美萍
    朱福英
    曹德新
    陈英方
    "Journal of China Textile University(English Edition) J", 1998, (03) : 70 - 72
  • [30] Charging of dielectric substrate materials during plasma immersion ion implantation
    Tian, XB
    Fu, RKY
    Chen, JY
    Chu, PK
    Brown, IG
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 2002, 187 (04): : 485 - 491