High-speed roll-to-roll nanoimprint lithography on flexible plastic substrates

被引：525

作者：

Ahn, Se Hyun ^{[2
]}

Guo, L. Jay ^{[1
]}

机构：

[1] Univ Michigan, Dept Elect Engn & Comp Sci, Ann Arbor, MI 48109 USA

[2] Univ Michigan, Dept Mech Engn, Ann Arbor, MI 48109 USA

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 11期

关键词：

D O I：

10.1002/adma.200702650

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Nanograting structures in either thermally or UV curable resist are continuously fabricated on a flexible plastic substrate by a high-speed roll-to-roll nanoimprint apparatus (see figure). As an example of the applications of such a roll-to-roll imprinting process, a high-performance metal wire-grid polarizer is demonstrated.

引用

页码：2044 / +

页数：7

共 23 条

[1] Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate [J].

Ahn, Se Hyun ;

Kim, Jin-Sung ;

Guo, L. Jay .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2007, 25 (06) :2388-2391

[2] Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etching [J].

Ahn, SW ;

Lee, KD ;

Kim, JS ;

Kim, SH ;

Lee, SH ;

Park, JD ;

Yoon, PW .

MICROELECTRONIC ENGINEERING, 2005, 78-79 :314-318

[3] Nanoimprinting over topography and multilayer three-dimensional printing [J].

Bao, LR ;

Cheng, X ;

Huang, XD ;

Guo, LJ ;

Pang, SW ;

Yee, AF .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2002, 20 (06) :2881-2886

[4] Fabrication of 10 nm enclosed nanofluidic channels [J].

Cao, H ;

Yu, ZN ;

Wang, J ;

Tegenfeldt, JO ;

Austin, RH ;

Chen, E ;

Wu, W ;

Chou, SY .

APPLIED PHYSICS LETTERS, 2002, 81 (01) :174-176

[5] Room-temperature, low-pressure nanoimprinting based on cationic photopolymerization of novel epoxysilicone monomers [J].

Cheng, X ;

Guo, LJ ;

Fu, PF .

ADVANCED MATERIALS, 2005, 17 (11) :1419-+

[6] Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[7] IMPRINT OF SUB-25 NM VIAS AND TRENCHES IN POLYMERS [J].

CHOU, SY ;

KRAUSS, PR ;

RENSTROM, PJ .

APPLIED PHYSICS LETTERS, 1995, 67 (21) :3114-3116

[8] Step and flash imprint lithography: A new approach to high-resolution patterning [J].

Colburn, M ;

Johnson, S ;

Stewart, M ;

Damle, S ;

Bailey, T ;

Choi, B ;

Wedlake, M ;

Michaelson, T ;

Sreenivasan, SV ;

Ekerdt, J ;

Willson, CG .

EMERGING LITHOGRAPHIC TECHNOLOGIES III, PTS 1 AND 2, 1999, 3676 :379-389

[9] Bilayer Al wire-grids as broadband and high-performance polarizers [J].

Ekinci, Y ;

Solak, HH ;

David, C ;

Sigg, H .

OPTICS EXPRESS, 2006, 14 (06) :2323-2334

[10] A novel approach to produce protein nanopatterns by combining nanoimprint lithography and molecular self-assembly [J].

Falconnet, D ;

Pasqui, D ;

Park, S ;

Eckert, R ;

Schift, H ;

Gobrecht, J ;

Barbucci, R ;

Textor, M .

NANO LETTERS, 2004, 4 (10) :1909-1914

← 1 2 3 →