Preparation of zinc oxide coatings by using newly designed metal-organic complexes of Zn: Effect of molecular structure of the precursor and surfactant over the crystallization, growth and luminescence

被引:10
作者
Brahma, Sanjaya [1 ]
Shivashankar, S. A. [1 ,2 ,3 ]
机构
[1] Indian Inst Sci, Mat Res Ctr, Bangalore 560012, Karnataka, India
[2] Indian Inst Sci, Ctr Nano Sci & Engn, Bangalore 560012, Karnataka, India
[3] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 701, Taiwan
关键词
Semiconductors; Thin films; Chemical synthesis; Optical properties; Photoelectron spectroscopies; Scanning electron microscopy; THIN-FILMS; MICROWAVE-IRRADIATION; OPTICAL-PROPERTIES; SI(100) SUBSTRATE; SELECTIVE GROWTH; POINT-DEFECTS; PHOTOLUMINESCENCE; DEPOSITION; NANORODS; PLASMA;
D O I
10.1016/j.jallcom.2013.09.060
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report large scale deposition of tapered zinc oxide (ZnO) nanorods on Si(100) substrate by using newly designed metal-organic complex of zinc (Zn) as the precursor, and microwave irradiation assisted chemical synthesis as a process. The coatings are uniform and high density ZnO nanorods (similar to 1.5 mu m length) grow over the entire area (625 mm(2)) of the substrate within 1-5 min of microwave irradiation. ZnO coatings obtained by solution phase deposition yield strong UV emission. Variation of the molecular structure/molecular weight of the precursors and surfactants influence the crystallinity, morphology, and optical properties of ZnO coatings. The precursors in addition with the surfactant and the solvent are widely used to obtain desired coating on any substrate. The growth mechanism and the schematics of the growth process of ZnO coatings on Si(100) are discussed. (c) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:331 / 338
页数:8
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