Zero- and one-dimensional nanostructures on an Si1-xGex/Si(100) surface

被引:1
|
作者
Jensen, F [1 ]
Petersen, JW [1 ]
Shiryaev, SY [1 ]
Larsen, AN [1 ]
机构
[1] AARHUS UNIV, INST PHYS & ASTRON, DK-8000 AARHUS, DENMARK
关键词
D O I
10.1088/0957-4484/7/2/004
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Zero- and one-dimensional nanostructures on the surface of Si1-xGex compositionally graded, epitaxial layers on Si(100) single crystals produced by a self-organized relaxation process are reported. Post-growth atomically flat surfaces can be converted into ordered, long-range coherent networks of nanostructures by a simple heat treatment procedure. The choice of heat treatment leads to a range of structures from millimeter long, single plateaus to complex patterns with nanometer structures and spacings. The vertical dimensions can be controlled in the nanometer range by varying the thickness of the Si1-xGex layer.
引用
收藏
页码:117 / 121
页数:5
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